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spiedigitallibrary.org
Massive metrology and inspection solution for EUV by area inspection SEM with machine learning technology
As the development of Extreme Ultraviolet Lithography (EUVL) is progressing toward the sub-10nm generation, the process window becomes very tight. In this situation, local Critical Dimension (CD) variability including stochastic defect directly affects the yield loss, and it is very important to inspect/measure all patterning area of interest ...
May 17, 2024
Extreme Ultraviolet Lithography
2:43
7.3K views · 169 reactions | What role does the reticle stage play in High NA extreme ultraviolet (EUV) lithography? In this video, learn how the reticle stage enables patterning in advanced chipmaking. You’ll see how 13.5 nanometer EUV light reflected into the system gets shaped by the illuminator and how a chip pattern gets encoded into the light for lithography. | ASML | Facebook
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Computing method for extreme ultraviolet lithography imaging with aberration consideration
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