In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
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New semiconductor etching process achieves five-fold speed improvement
After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...
Trymax Semiconductor B.V. provides plasma-based etching, stripping, and curing process equipment for advanced semiconductor ...
Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...
In this white paper we present a suite of plasma processing tools for FA with the aim of providing practical guidance as to their suitability for different tasks. One way of uncovering a fault and ...
A new cryogenic plasma etching technique developed by Japanese researchers dramatically accelerates semiconductor fabrication while cutting environmental impact, offering a potential breakthrough for ...
FORT COLLINS, Colo., May 17, 2017 (GLOBE NEWSWIRE) -- Advanced Energy Industries, Inc. (AEIS), a global leader in precision power conversion, announced today that its solid-state matching network has ...
“Plasma” refers to a gas with a significant proportion of ionized molecules, which produce various excited ions, atoms, and molecules. Electrons liberated from ions and atoms are highly energetic and ...
Trymax Semiconductor B.V. provides plasma-based etching, stripping, and curing process equipment for advanced semiconductor packaging, targeting applications in dry descum, ashing, surface preparation ...
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