The fabrication of nanoscale devices increasingly relies on techniques that offer atomic‐scale precision, with Atomic Layer Deposition (ALD) and Area-Selective Deposition (ASD) at the forefront. ALD ...
How atomic-layer deposition and hybrid dielectrics are redefining reliability and scaling for AI-era semiconductors.
Atomic Layer Deposition (ALD) and thin film technologies have become indispensable in modern materials science thanks to their ability to achieve angstrom‐level control over film thickness and ...
Anna Demming discovers why the vacuum-based technique of atomic-layer deposition – a variant of chemical-vapour deposition – holds so much promise for energy and environmental applications Greener ...
Advancements in Applied Materials Machines for Enhanced Chip Performance It’s pretty wild how much chip performance has ...
Using atomic layer deposition, a research team from the City University of Hong Kong has created an an oxygen-deficient tin oxide layer to replace the more common fullerene electron transport layer in ...
In this interview, discover how ATLANT 3D's DALP technology is revolutionizing thin-film deposition, enabling rapid prototyping and advanced material applications in nanofabrication. Can you please ...
FREMONT, Calif., Feb. 19, 2025 /PRNewswire/ — Lam Research Corp. (Nasdaq: LRCX) today unveiled ALTUS ® Halo, the world’s first atomic layer deposition (ALD) tool that harnesses the capabilities of the ...
The integration of in situ argon plasma annealing results in improved film density, stoichiometry, and crystallinity. These findings are significant for industries looking for cost-effective, ...
Transition metal oxides host a rich variety of strongly correlated electronic phases, including high-temperature superconductivity, ferromagnetism, antiferromagnetism, and charge density waves. These ...
Continuous downscaling of the critical dimensions in semiconductor devices is the cornerstone of technological revolution. As the technology nodes keep shrinking, innovations in fabrication ...
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